| 摘要 |
PROBLEM TO BE SOLVED: To prevent the re-adhesion of a photoresist and a reaction product of ozone to a cleaning region of a substrate surface, in a photoresist removing device using high density ozone water. SOLUTION: A photoresist removing device includes a support base which supports and rotates a substrate for cleaning, a cleaning nozzle arrangingly provided on the upper part of the support base, the filling port of which is pointed downward, and a high density ozone water-supplying apparatus which supplies the high density ozone water to the cleaning nozzle, wherein the cleaning nozzle consists of a plurality of unit cleaning nozzles arranged leaving a predetermined distance from the rotation center of the substrate, each cleaning unit nozzle is arranged shifting in the circumference direction of the substrate so that the overlap of the direction of the flow of the high density ozone water discharged from each unit cleaning nozzle on the substrate is reduced. COPYRIGHT: (C)2011,JPO&INPIT |
