发明名称 |
Acid generator, chemically amplified resist composition, and patterning process |
摘要 |
The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: To provide a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of LER and a depth of focus and can be effectively and widely used particularly without degradation of a resolution, a chemically amplified resist composition using the same, and a patterning process. |
申请公布号 |
EP2634631(A1) |
申请公布日期 |
2013.09.04 |
申请号 |
EP20130000856 |
申请日期 |
2013.02.20 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
OHASHI, MASAKI;KOBAYASHI, TOMOHIRO;SAGEHASHI, MASAYOSHI |
分类号 |
G03F7/004;G03F7/039;G03F7/11;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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