发明名称 Method of manufacturing an ultra-high-density capacity comprising pillar-shaped capacitors formed on both sides of a substrate
摘要 <p>The present invention describes an ultra High-Density Capacitor design, integrated in a semiconductor substrate, preferably a Si substrate, by using both wafer sides. The capacitors are pillar-shaped and comprise electrodes (930,950) separated by a dielectric layer (940). Via connections (920) are provided in trenches that go through the whole thickness of the wafer.</p>
申请公布号 EP2255376(B1) 申请公布日期 2013.09.04
申请号 EP20090712370 申请日期 2009.02.17
申请人 NXP B.V. 发明人 NEUILLY, FRANCOIS;LE CORNEC, FRANCOIS
分类号 H01L21/02;H01L21/334;H01L21/768;H01L23/498;H01L27/02;H01L27/06;H01L27/08;H01L29/66;H01L29/94 主分类号 H01L21/02
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