发明名称 SUBSTRATE WASHING DEVICE
摘要 An apparatus for cleaning a whole substrate by ejecting a cleaning liquid from a nozzle while rotating the substrate, the apparatus comprising: two or more linear reciprocating driving sources capable of generating outputs independently of one another; a rotation shaft; two or more cam mechanisms for converting the outputs into rotating forces; two or more sets of rotation columns fixed to the rotation shaft rotatably about their respective axes to horizontally support the substrate and sandwich or release the side surface of the substrate in cooperation with one another along with their rotation; two or more transfer members capable of transferring the rotating force to the sets of rotation columns in conjunction with the cam mechanisms, respectively; and a stopper causing the rotation of the cam mechanisms to be related to the rotation of the rotation shaft.
申请公布号 KR101303023(B1) 申请公布日期 2013.09.03
申请号 KR20060100602 申请日期 2006.10.17
申请人 发明人
分类号 B08B3/02;B08B3/10 主分类号 B08B3/02
代理机构 代理人
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