发明名称 |
Process for the production of microelectromechanical systems |
摘要 |
Elemental fluorine and carbonyl fluoride are suitable etchants for producing microelectromechanical devices ("MEMS"). They are preferably applied as mixtures with nitrogen and argon. If applied in Bosch-type process, C4F6 is a highly suitable passivating gas.
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申请公布号 |
US8524112(B2) |
申请公布日期 |
2013.09.03 |
申请号 |
US20080808718 |
申请日期 |
2008.12.16 |
申请人 |
RIVA MARCELLO;SOLVAY FLUOR GMBH |
发明人 |
RIVA MARCELLO |
分类号 |
C09K13/00;C09K13/04;C09K13/06;C09K13/08 |
主分类号 |
C09K13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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