发明名称 SURFACE PROTECTIVE FILM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a surface protective film that wraps foreign matter entering between the surface protective film and a protected member and further can hold the foreign matter while the foreign matter is wrapped.SOLUTION: There is provided a surface protective film that includes an absorption layer 1 containing a thermoplastic resin A having a storage modulus G'(25) of 1×10Pa or higher measured at 25°C at a frequency of 1.6 Hz, wherein the thermoplastic resin A has a minimum temperature (T) at which a storage modulus G'measured at the frequency of 1.6 Hz is minimum, and the minimum temperature (T), a glass transition temperature (Tg) of the thermoplastic resin A, and a melting temperature (Tm) of the thermoplastic resin A satisfy the following expression. Tg&le;TA<Tm.
申请公布号 JP2013169685(A) 申请公布日期 2013.09.02
申请号 JP20120034384 申请日期 2012.02.20
申请人 MITSUI CHEMICALS INC 发明人 ASAI SHINICHI;UEKUSA TAKAYUKI
分类号 B32B27/00;C09J7/02;C09J201/00;H01L21/304 主分类号 B32B27/00
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