PHOTOPOLYMERIZABLE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a curable composition for imprinting having excellent patternability.SOLUTION: There are provided a photocurable composition comprising (A) a polymerizable compound and (B) a photopolymerization initiator expressed by general formula (I) provided that the zinc content and aluminum content of the composition are <5 ppb each; and a pattern-forming method including a step to form a pattern-forming layer by applying the photocurable composition to a substrate, a step to bond a mold with pressure on a surface of the pattern-forming layer, and a step to irradiate the pattern-forming layer with light.