| 摘要 |
PROBLEM TO BE SOLVED: To improve a film forming rate by efficiently depositing fine particles of a raw material on a substrate, in a film forming method by aerosol deposition.SOLUTION: A film forming apparatus includes a film forming chamber in which a substrate is placed, and a fine particle injection nozzle which is provided in the film forming chamber and sprays aerosol toward the substrate. The aerosol is prepared by dispersing fine particles of a raw material in a gas, and used to form a film of the raw material fine particles on the substrate. The fine particle injection nozzle includes a nozzle part for the fine particles which sprays the aerosol, in which the raw material fine particles are dispersed in the gas, and a plurality of nozzles for gas which are so arranged as to surround the periphery of the nozzle part for fine particles and spray the gas. A ratio of a gas velocity sprayed from the nozzle part for gas to a velocity of the raw material fine particles sprayed from the nozzle part for fine particles is 0.5-1.2. |
