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发明名称
半导体制程之输送装置
摘要
本创作系提供一种半导体制程之输送装置,其包含一输送链带,及复数个结合于输送链带上用以承载半导体的承载元件;该承载元件具有一用于接触半导体的承载部,承载部的表面设有一钛基镀膜层,该钛基镀膜层可以是氮化钛单层膜(TiN)、氮化碳钛单层膜(TiCN)、氮化铝钛单层膜(TiAlN),或是氮化钛与氮化铝钛多层膜(TiN/TiAlN)。藉此,本创作半导体制程之输送装置,能够达到提升耐磨耗机械特性及延长使用寿命之目的。
申请公布号
TWM461143
申请公布日期
2013.09.01
申请号
TW102208404
申请日期
2013.05.06
申请人
朱贤明 新竹县竹北市文化街86号
发明人
朱贤明
分类号
H01L21/00;B65G23/02
主分类号
H01L21/00
代理机构
代理人
主权项
地址
新竹县竹北市文化街86号
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