发明名称 CLEANING APPARATUS, EQUIPMENT, AND METHOD
摘要 39 Abstract Cleaning Apparatus, Equipment, and Method5 Subject: There is provided a cleaning apparatus, equipment and method allowing an object to be cleaned without an area which is not directly exposed to an ultrasonic wave.Solving Means: A cleaning apparatus I includes a cleaning tank.W 2, a coupling tank 3, an ultrasonic wave generation unit 6, and a modification unit 7. The cleaning tank 2 holds a cleaning liquid 4 for cleaning a substrate 10 serving as an object to becleaned. The coupling tank 3 holds an intermediate medium 5, and the cleaning tank 2 has a portion in contact with theIS intermediate medium 5. The ultrasonic wave generation unit 6 is provided at the coupling tank 3, and ultrasonically vibrates the cleaning liquid 4 via the intermediate medium 5. Themodification unit 7 modifies a difference in sonic velocity between the cleaning liquid 4 and the intermediate medium. 5.20Fig. 1
申请公布号 SG192377(A1) 申请公布日期 2013.08.30
申请号 SG20130005368 申请日期 2013.01.22
申请人 SILTRONIC AG 发明人 YOSHIHIRO MORI;TERUO HAIBARA;ETSUKO KUBO;MASASHI UCHIBE
分类号 主分类号
代理机构 代理人
主权项
地址