发明名称 IMPURITY DIFFUSION LAYER FORMING COMPOSITION, METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING IMPURITY DIFFUSION LAYER, AND METHOD OF MANUFACTURING SOLAR CELL ELEMENT
摘要 <p>Provided is an impurity diffusion layer forming composition which contains: a compound having a donor element or a compound having an acceptor element; a dispersion medium; and a compound represented by general formula (I). In general formula (I), R1 and R2 independently represent a hydrogen atom or an alkyl group, and R3 represents an alkylene group. n represents an arbitrary integer greater than or equal to 1.</p>
申请公布号 WO2013125252(A1) 申请公布日期 2013.08.29
申请号 WO2013JP50304 申请日期 2013.01.10
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 ORITA, AKIHIRO;YOSHIDA, MASATO;NOJIRI, TAKESHI;KURATA, YASUSHI;MACHII, YOICHI;IWAMURO, MITSUNORI;SHIMIZU, MARI;SATO, TETSUYA;ASHIZAWA, TORANOSUKE
分类号 H01L21/225;H01L31/04 主分类号 H01L21/225
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