发明名称 PARTICLE BEAM SYSTEM INCLUDING SOURCE OF PROCESS GAS TO PROCESSING PLACE
摘要 PROBLEM TO BE SOLVED: To provide a system capable of supplying one or more different process gas to a processing place, having the improved composition, and/or capable of controlling more precisely a supply process gas.SOLUTION: A system which supplies process gas to the processing place 7 of the particle beam system 1 includes a gas reservoir 63, a gas duct 65, a pipe 69 locates near the processing place, and a valve 67 prepared between the gas duct and the pipe, and a controller which is constituted such that a system can be changed from a first operational mode that does not supply the process gas to the processing place to a second operational mode that supplies the process gas to the processing place via opening and closing of the valve 67. The controller can periodically open and close the valve 67 alternately, and each period includes a first temporal duration during which the valve opens and a second temporal duration during which the valve closes and can change a ratio between the first temporal duration and the second temporal duration.
申请公布号 JP2013167018(A) 申请公布日期 2013.08.29
申请号 JP20130010160 申请日期 2013.01.23
申请人 CARL ZEISS MICROSCOPY GMBH 发明人 ZEILE ULRIKE;KNAPPICH MATTHIAS
分类号 C23C16/455;H01J37/305;H01J37/317 主分类号 C23C16/455
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