| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition for liquid immersion exposure, which exhibits sufficient general characteristics such as sensitivity and LWR (line width roughness), can reduce development defects during development and is excellent in storage stability.SOLUTION: The resist composition for liquid immersion exposure comprises: [A] a polymer, which has a structural unit (I) including a group expressed by formula (i) and includes a fluorine atom; and [B] an acid generator. In formula (i), Rrepresents an alkali dissociable group; A represents -SO-O-*, -SO-O-*, -NO-O-*, -N-O-*, -B(OR)-O-*, -P(=O)(OR)-O-* or a group expressed by formula (ii), in which * represents a coupling moiety with the above R; and Rand Reach independently represent a monovalent hydrocarbon group having 1 to 20 carbon atoms. |
