发明名称 |
PLASMA BOUNDARY LIMITER UNIT AND APPARATUS FOR TREATING SUBSTRATE |
摘要 |
Provided is an apparatus for treating a substrate. The apparatus comprises a plasma boundary limiter unit disposed within a process chamber to surround a discharge space defined above a support unit. The plasma boundary limiter unit comprises a plurality of plates disposed along a circumference of the discharge space, and the plurality of plates are spaced apart from each other along the circumference of the discharge space so that a gas within the discharge space flows to the outside of the discharge space through passages provided between the adjacent plates.
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申请公布号 |
US2013220550(A1) |
申请公布日期 |
2013.08.29 |
申请号 |
US201313779992 |
申请日期 |
2013.02.28 |
申请人 |
SEMES CO., LTD.;SEMES CO., LTD. |
发明人 |
KOO IL GYO;SHIM HYUN JONG |
分类号 |
B05C11/00 |
主分类号 |
B05C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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