摘要 |
<p>Provided is a centrifugal barrel polishing device capable of maintaining or improving polishing efficiency while increasing stock removal rate. The centrifugal barrel polishing device (10) polishes workpieces using polishing stones by loading the workpieces and the polishing stones in multiple barrels (12) that undergo planetary rotation. If N is defined as the speed of revolution of the barrels (12), n as the speed of rotation of the barrels (12), R as the radius of the path of revolution (15) drawn by the rotation axes (14) (centers of rotation) of the barrels (12), n/N as the rotation/revolution ratio, which is the ratio of the speed of rotation n to the speed of revolution N of the barrels (12), and F=4pi2N2R/g as the relative centrifugal acceleration, which is the ratio of the centrifugal acceleration on the path of revolution (15) during planetary rotation of the barrels (12) to the gravitational acceleration g, the relative centrifugal acceleration F during planetary rotation of the barrels (12) is set to be in the range of the formula: -2.5(n/N)+12.6 <= F <= 6.1(n/N)+40.7.</p> |