| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition giving a cured film exhibiting high adhesiveness, high transparency, and excellent mold releasability and antistatic properties, without deteriorating high heat resistance of a coating film.SOLUTION: A photosensitive composition contains: pentaerythritol(tri and/or tetra)(meth)acrylate (A); tri(meth)acrylate (B) of an alkylene oxide adduct of trimethylol propane, having a number-average molecular weight of 350-100,000; dipentaerythritol(penta and/or hexa)(meth)acrylate (C); trimethylol propane tri(meth)acrylate (D); and a polymerization initiator (E). |
