OVERLAY MEASURING METHOD, MEASURING DEVICE, SCANNING ELECTRON MICROSCOPE AND GUI

摘要

PROBLEM TO BE SOLVED: To provide a method for easily and robustly measuring an overlay in an area where an actual device circuit pattern is formed in manufacturing a semiconductor device.SOLUTION: An overlay measuring method is a method for measuring an overlay of a semiconductor device in which a circuit pattern is formed through a plurality of times of exposure step. The method includes: an image pickup step of picking up images of a plurality of areas of the semiconductor device; a reference image setting step of setting a reference image from among the plurality of picked-up images which are picked up in the image pickup step; a difference quantification step of quantifying a difference between the reference image set in the reference image setting step and the plurality of picked-up images which are picked up in the image pickup step; and an overlay calculation step of calculating the overlay based on the difference quantified in the difference quantification step.