发明名称 Method For Cleaning Fine Pattern Surface Of Mold, And Imprinting Device Using Same
摘要 A method for removing foreign matters attaching on a surface of a fine pattern of a mold, having the fine pattern being convexo-concave, at least on one surface thereof, thereby cleaning the fine pattern surface of the mold, and an imprinting device applying that method therein, without removing, comprises the following steps of: applying a photo-curable resin on a surface of a body to be transcribed, onto which the mold is suppressed, and thereby forming a photo-curable resin layer; suppressing the mold on the photo-curable resin, which is applied on the surface of the body to be transcribed; separating the photo-curable resin cured from the mold, after curing the photo-curable resin, and whereby taking the foreign matters attaching on the surface of the fine pattern into the photo-curable resin cured to remove them, wherein the photo-curable resin to be formed on the surface of the body to be transcribed is formed with such thickness that it can remove the foreign matters attaching on the fine pattern, and also the mold is suppressed onto the photo-curable resin, which is formed on the surface of the body to be transcribed, under such pressure that it can remove the foreign matters attaching on the fine pattern.
申请公布号 US2013224322(A1) 申请公布日期 2013.08.29
申请号 US201113883844 申请日期 2011.11.11
申请人 SHIZAWA NORITAKE;YAMASHITA NAOAKI;AOKI MASASHI;HATOGAI TETSUHIRO;HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SHIZAWA NORITAKE;YAMASHITA NAOAKI;AOKI MASASHI;HATOGAI TETSUHIRO
分类号 B29C59/16;B29C33/72 主分类号 B29C59/16
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