| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition suitable for immersion exposure, a method of forming a resist pattern using the same, and a fluorine-containing compound useful for an additive used in the same.SOLUTION: A compound is represented by general formula (c-1-1) or (c-1-2). In the formula: R is a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X is a specific organic group having no acid dissociable moiety; Ais an aromatic cyclic group which may have a substituent; Xis a single bond or a divalent bonding group; and Ris an organic group having a fluorine atom. |
