发明名称 |
METHOD AND APPARATUS FOR DETECTING ARC IN PLASMA CHAMBER |
摘要 |
An apparatus for detecting an arc in a plasma chamber is designed to detect the respective voltage and current values of RF power supplied to the plasma chamber and calculate the ratio of the voltage and current values to accomplish a required control of the supplying of the power. When it is determined that the arc is generated, the apparatus rapidly controls the supplying of the power to prevent damages on the plasma chamber and contaminations on the materials to be processed due to the generation of the arc. |
申请公布号 |
US2013221847(A1) |
申请公布日期 |
2013.08.29 |
申请号 |
US201313779181 |
申请日期 |
2013.02.27 |
申请人 |
NEW POWER PLASMA CO., LTD.;NEW POWER PLASMA CO., LTD. |
发明人 |
CHOI SANG-DON |
分类号 |
G01R31/24;H05H1/46 |
主分类号 |
G01R31/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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