CLEANING LIQUID FOR SEMICONDUCTOR DEVICE SUBSTRATES AND CLEANING METHOD

摘要

The invention relates to a cleaning liquid for semiconductor device substrates, which is for use in a step of cleaning a semiconductor device substrate to be conducted after a chemical mechanical polishing step in semiconductor device production, the cleaning liquid including the following components (A) to (D): (A) an organic acid; (B) a sulfonic acid type anionic surfactant; (C) at least one polymeric coagulant selected from polyvinylpyrrolidone and polyethylene oxide-polypropylene oxide block copolymers; and (D) water.