发明名称 METHOD FOR MANUFACTURING N-TYPE SiC SINGLE CRYSTAL
摘要 A method for manufacturing an n-type SiC single crystal, enables the suppression of the variation in nitrogen concentration among a plurality of n-type SiC single crystal ingots manufactured. A method includes the steps of: providing a manufacturing apparatus (100) including a chamber (1) having an area in which a crucible (7) is to be disposed; heating the area in which the crucible (7) is to be disposed and evacuating the gas in the chamber (1); filling, after the evacuation, the chamber (1) with a mixed gas containing a noble gas and nitrogen gas; heating and melting a starting material housed in the crucible (7) disposed in the area to produce a SiC solution (8) containing silicon and carbon; and immersing a SiC seed crystal into the SiC solution under the mixed gas atmosphere to grow an n-type SiC single crystal on the SiC seed crystal.
申请公布号 US2013220212(A1) 申请公布日期 2013.08.29
申请号 US201113883350 申请日期 2011.11.04
申请人 KUSUNOKI KAZUHIKO;KAMEI KAZUHITO;YASHIRO NOBUYOSHI;MORIGUCHI KOUJI;OKADA NOBUCHIRO;DANNO KATSUNORI;DAIKOKU HIRONORI;TOYOTA JIDOSHA KABUSHIKI KAISHA;NIPPON STEEL & SUMITOMO METAL CORPORATION 发明人 KUSUNOKI KAZUHIKO;KAMEI KAZUHITO;YASHIRO NOBUYOSHI;MORIGUCHI KOUJI;OKADA NOBUCHIRO;DANNO KATSUNORI;DAIKOKU HIRONORI
分类号 C30B15/20;C30B15/10;C30B15/30;C30B15/36 主分类号 C30B15/20
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