发明名称 METHOD WITH REGISTER BETWEEN PRINT ELEMENT AND WATER MARK
摘要 The invention relates to a method for producing a security element (1), wherein a substrate (2) is provided which has a front and a rear side (3, 4), is translucent at least for specific radiation (10) and has a water mark (5) which modulates the opacity of the substrate (2), a print element (9) is applied to the front side (3), wherein the print element (9) covers the water mark (5) at least partially on the front side (3), the print element (9) can be modified by means of the specific radiation (10), and the substrate (2) is penetrated by the specific radiation (10) from the rear side (4), wherein the water mark (5) is used as a mask with regard to the modification of the print element (9), and the print element (9) is modified in register with the water mark (5).
申请公布号 WO2013124059(A1) 申请公布日期 2013.08.29
申请号 WO2013EP00489 申请日期 2013.02.20
申请人 GIESECKE & DEVRIENT GMBH 发明人 SCHIFFMAN, PETER;REINER, HARALD;KECK-ANGERER, ANGELIKA;KISSELOVA, JANA
分类号 B41M3/00;B41M3/10;B41M3/14;B42D15/10 主分类号 B41M3/00
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