EXPOSURE APPARATUS AND CONTROLLING METHOD OF EXPOSURE APPARATUS

摘要

PURPOSE: An exposure apparatus and a control method thereof are provided to add lenses for changing a diameter of beam to prevent damage in the inside of an exposure beam generator even for long-term use, thereby maintaining the uniform illumination of exposure beam and the uniformity of illumination to maintain the constant exposure capability. CONSTITUTION: An exposure apparatus comprises an exposure beam generator for generating exposure beam and a vacuum chamber which the exposure beam generated by the exposure beam generator passes through and which includes a first fly eye lens having a plurality of convex lenses like the eyes of fly. The exposure beam generator comprises an oscillator including an oscillator pumping chamber, first and second prisms, and a first exposure beam diameter changing lens positioned in the front end of the first prism to expand a diameter of the exposure beam. A control method for exposure apparatus comprises the steps of: generating the exposure beam by the exposure beam generator; measuring a form of the exposure beam within the vacuum chamber; and adjusting the first exposure beam diameter changing lens or a second exposure beam diameter changing lens when the measured form of the exposure beam is out of a specified range.