ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND RESIST FILM EACH USING SAID COMPOSITION, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE EACH USING THESE

摘要

PROBLEM TO BE SOLVED: To provide: an active light-sensitive or radiation-sensitive resin composition which is excellent in sensitivity, resolution, roughness performance and long-term stability while reducing generation of an outgas; a pattern forming method and a resist film using the composition; and a method for manufacturing an electronic device and the electronic device using these.SOLUTION: An active light-sensitive or radiation-sensitive resin composition contains a compound represented by the specified general formula (Z1), which generates an acid when irradiated with active light or radiation.