发明名称 Semiconductor processing apparatus comprising a solid solution ceramic formed from yttrium oxide, zirconium oxide, and aluminum oxide
摘要 A solid solution-comprising ceramic article useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The solid solution-comprising ceramic article is formed from a combination of yttrium oxide, zirconium oxide, and aluminum oxide. In a first embodiment, the solid solution-comprising ceramic article is a solid, sintered body of the solid solution ceramic material. In a second embodiment, the solid solution-comprising article comprises a substrate underlying a solid solution-comprising coating.
申请公布号 US2013224498(A1) 申请公布日期 2013.08.29
申请号 US201313986040 申请日期 2013.03.25
申请人 SUN JENNIFER Y.;DUAN REN-GUAN;YUAN JIE;XU LI;COLLINS KENNETH S. 发明人 SUN JENNIFER Y.;DUAN REN-GUAN;YUAN JIE;XU LI;COLLINS KENNETH S.
分类号 C04B35/505 主分类号 C04B35/505
代理机构 代理人
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