发明名称 |
CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE |
摘要 |
A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid. |
申请公布号 |
US2013220930(A1) |
申请公布日期 |
2013.08.29 |
申请号 |
US201313856442 |
申请日期 |
2013.04.04 |
申请人 |
JSR CORPORATION;JSR CORPORATION |
发明人 |
HARADA KENTARO;WAKAMATSU GOJI |
分类号 |
B01D15/00;C08K5/07;C08K5/103 |
主分类号 |
B01D15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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