发明名称 CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE
摘要 A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.
申请公布号 US2013220930(A1) 申请公布日期 2013.08.29
申请号 US201313856442 申请日期 2013.04.04
申请人 JSR CORPORATION;JSR CORPORATION 发明人 HARADA KENTARO;WAKAMATSU GOJI
分类号 B01D15/00;C08K5/07;C08K5/103 主分类号 B01D15/00
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