Method for applying a heat insulation layer

摘要

The method comprises producing a plasma beam (5) and introducing a metallic substrate surface into a working chamber (2) with a plasma burner (4), applying a ceramic coating material on the surface of the substrate by plasma spray-physical vapor deposition, where the ceramic coating material is injected as a powder into the plasma beam and partially or completely evaporated, and applying a heat-insulating layer on the surface of the substrate, where a feed rate of the injected powder is adjusted so that the injected powder (greater than 80 wt.%) is evaporated/completely evaporated. The method comprises producing a plasma beam (5) and introducing a metallic substrate surface into a working chamber (2) with a plasma burner (4), applying a ceramic coating material on the surface of the substrate by plasma spray-physical vapor deposition, where the ceramic coating material is injected as a powder into the plasma beam and partially or completely evaporated, and applying a heat-insulating layer on the surface of the substrate, where a feed rate of the injected powder is adjusted so that the injected powder (greater than 80 wt.%) is evaporated or completely evaporated and/or the applied layer is free of slats and nanoscale cluster. The coating material is removed from a vapor phase onto the substrate surface and forms mixed phases on the substrate surface. The feed rate of the injected powder is gradually increased to a factor of 10 and decreased while increasing a part of the injected powder to be evaporated. The coating material is applied in the form of elongated columns, forms an anisotropic microstructure, and is oriented perpendicular to the substrate surface. The substrate surface is formed with an adhesive layer and/or a hot gas corrosion protection layer, a layer of an alloy and a thermal oxide layer. The substrate is made of super alloy. The ceramic coating material contains oxide-ceramic components. The feed rate of the injected Powder is of 0.5-5 g/minute in the working chamber, and is 5-40 g/minute in the applying step. The heat-insulating layer has a thickness of 0.5-5 mu m. An independent claim is included for a substrate or workpiece.