| 摘要 |
PURPOSE: A spray unit and a substrate processing device including the same are provided to prevent a process by-product from being deposited on a discharge hole of a spray nozzle by providing the discharge hole on the side or the bottom of the spray nozzle. CONSTITUTION: A chamber(100) is in the shape of a cylinder. A substrate support unit(200) has a substrate holder(210) and a susceptor(230). A spray unit(300) has a spray nozzle(310), a gas supply line(350) and a cover(330). An exhaust unit(400) includes an exhaust ring(410), an exhaust pipe(430) and a pump(450). A heater(500) is installed on the lower part of the susceptor. |
