| 摘要 |
The present invention provides a mask inspection apparatus and method capable of inspecting masks used in double patterning with satisfactory accuracy. Optical images of two masks are acquired (S100). The acquired optical images of the two masks are combined together (S102). Relative positional displacement amounts of patterns of the first mask and patterns of the second mask are measured at the combined image (S104). The measured relative positional displacement amounts are compared with standard values to thereby determine whether the two masks are good (S106). |
