| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming device which allows a substrate to be mounted on a susceptor at a suitable position so that the substrate after film formation processing does not stick on the susceptor. SOLUTION: The film forming device 1 includes a film formation chamber 2 which incorporates the susceptor 20 mounted with the substrate W and performs the film formation processing on the substrate W while rotating the susceptor 20, a conveyance chamber 4 connected to the film formation chamber 2, a substrate standby chamber 8 connected to the conveyance chamber 4, and a conveyance means 17 provided in the conveyance chamber 4 and for conveying the substrate W between the film formation chamber 2 and substrate standby chamber 8. Further, the film forming device includes a first positioning mechanism 5 configured to position the center of the substrate W in the substrate standby chamber 8 at a first reference position and a second positioning mechanism 6 configured to position the center of the substrate W having been conveyed from the substrate standby chamber 8 at a second reference position in the film formation chamber 2, the second reference position being in the center of the susceptor 20. COPYRIGHT: (C)2010,JPO&INPIT |
