| 摘要 |
Methods and associated structures of forming microelectronic devices are described. Those methods may include coating an interconnect structure disposed on a die with a layer of functionalized nanoparticles, wherein the functionalized nanoparticles are dispersed in a solvent, heating the layer of functionalized nanoparticles to drive off a portion of the solvent, and applying an underfill on the coated interconnect structure. |
