RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

PURPOSE: A resist composition and a method for forming a resist pattern are provided to improve the resolution and lithography characteristics. CONSTITUTION: A resist composition contains a base component (A) which generates acid upon exposure and shows changed solubility in a developing solution under action of acid and an organic solvent component (S). The base component contains a resin component (A0) comprising a structural unit (a0) which generates acid. The organic solvent component contains an organic solvent component (S1) comprising a compound represented by general formula (s-1). A method for forming a resist pattern comprises the steps of: forming a resist film on a supporter by using the resist composition; exposing the resist film; and developing the resist film to form the resist pattern.