发明名称 |
Resist composition for immersion exposure and method of forming resist pattern using the same |
摘要 |
A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), R1 represents an organic group which may contain a polymerizable group; X represents a divalent organic group having an acid dissociable portion; and R2 represents an organic group having a fluorine atom).
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申请公布号 |
US8518629(B2) |
申请公布日期 |
2013.08.27 |
申请号 |
US201113218797 |
申请日期 |
2011.08.26 |
申请人 |
KUROSAWA TSUYOSHI;SHIMIZU HIROAKI;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KUROSAWA TSUYOSHI;SHIMIZU HIROAKI |
分类号 |
G03F7/004;G03F7/039;G03F7/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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