发明名称 |
Debris protection system having a magnetic field for an EUV light source |
摘要 |
Devices are disclosed herein which may comprise a vessel; a material disposed in the vessel for creating an EUV light emitting plasma at a plasma site, the plasma generating debris; a near normal incidence EUV reflective optic disposed in the vessel; and a source of a magnetic field for deflecting debris in the vessel to protect the optic, the source positioned to interpose the optic between the source and the plasma site.
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申请公布号 |
US8519366(B2) |
申请公布日期 |
2013.08.27 |
申请号 |
US20080221822 |
申请日期 |
2008.08.06 |
申请人 |
BYKANOV ALEXANDER N.;ERSHOV ALEXANDER I.;CYMER, INC. |
发明人 |
BYKANOV ALEXANDER N.;ERSHOV ALEXANDER I. |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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