发明名称 |
Method, program product and apparatus for modeling resist development of a lithography process |
摘要 |
A method of generating a model for simulating the imaging performance of an optical imaging system. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; and defining a model equation representing the imaging performance of the optical imaging system and the process, where the model equation includes a resist performance component, and the resist performance component includes a non-linear model of the resist performance.
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申请公布号 |
US8521481(B2) |
申请公布日期 |
2013.08.27 |
申请号 |
US20070896292 |
申请日期 |
2007.08.30 |
申请人 |
TEJNIL EDITA;ASML MASKTOOLS B.V. |
发明人 |
TEJNIL EDITA |
分类号 |
G06F7/60;G03F1/00;G06F17/10;G06F17/50 |
主分类号 |
G06F7/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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