| 摘要 |
PURPOSE: An electron beam writing device and an electron beam writing method reduce the drift of an electron beam due to reflected electrons or secondary electrons by applying a positive voltage to an electrostatic lens. CONSTITUTION: A sample (216) is placed on an XY stage (105). An electron body tube (102) includes an electron gun (201) and a lens. The lens includes an electrode aligned in an axial direction of an electron beam (200). A shielding plate (211) is placed between the XY stage and the electron body tube, and reduces reflected electrons or secondary electrons which are generated by irradiating the electron beam to the sample. An electrostatic lens (210) is placed immediately above the shielding plate and changes a focal position of the electron beam. A voltage supply unit (135) applies a positive voltage constantly to the electrostatic lens. [Reference numerals] (110) Control calculator; (112) Writing data processing unit; (120) Deflection control circuit; (121) Deflection amount calculator; (124) Deflection signal generating unit; (130,131,132,133) DAC amplifier unit; (135) Voltage supply means; (143) Detector; (145) Laser length measurement unit |
