| 摘要 |
[Problem] To provide an apparatus for forming an organic thin film, wherein an organic thin film deposited on the surface of a deposition prevention plate can be easily removed. [Solution] An apparatus for forming an organic thin film, which comprises: a vacuum chamber; a substrate stage that is arranged within the vacuum chamber; a gas supply unit for supplying an organic material gas into the vacuum chamber through a supply port that is exposed to the inside of the vacuum chamber; and a deposition prevention plate that is fitted to the inner wall surface of the vacuum chamber. The apparatus for forming an organic thin film forms an organic thin film from the organic material gas on the substrate that is arranged on the surface of the substrate stage. A fluororesin-containing electroless nickel film that contains a polytetrafluoroethylene at a volume ratio of 20-40% (inclusive) relative to the volume of the entire film is formed on the exposed surface of the deposition prevention plate. Since the fluororesin-containing electroless nickel film has releasability with respect to organic thin films, even if an organic film is deposited thereon, the organic thin film can be easily removed by high-pressure washing or the like.
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