BLOCK COPOLYMER AND METHOD RELATED THERETO

摘要

PROBLEM TO BE SOLVED: To provide a block copolymer composition, and to provide a patterned substrate treated with the same.SOLUTION: A block copolymer composition containing a diblock copolymer blend includes: a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer; and a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer.