| 摘要 |
PROBLEM TO BE SOLVED: To provide a drawing device advantageous to drawing of a target pattern.SOLUTION: A drawing device for drawing a pattern on a substrate by using a charged particle beam includes a generating unit for generating drawing data, and a charged particle optical system for generating the charged particle beam on the basis of the drawing data generated in the generating unit. The generating unit sets a plurality of pixels corresponding to a target pattern having a width, and on the basis of an intensity distribution of the charged particle beam obtained on the substrate when applying to the plurality of pixels the charged particle beam having preset intensity in which among the plurality of pixels there is a difference between pixels corresponding to ends of the target pattern and pixels other than the pixels, adjusts the preset distribution so as to obtain a distribution intensity corresponding to the width on the substrate, to thereby generate the drawing data. |
