| 摘要 |
A resist layer made of oxonol-based dye, and the OD value of which is greater than or equal to 1.0 and less than or equal to 1.6 with respect to light having the wavelength of 580 nm, is formed on a substrate. The formed resist layer is scanned with a laser beam at a scan speed of higher than or equal to 3 m/s and lower than or equal to 10 m/s. A ring-shaped pattern is formed by developing the resist layer scanned with the laser beam using a developer containing alcohol as a main component.
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