摘要 |
A method of manufacturing a display device including an electrostatic discharge protection circuit, the method including: forming an amorphous silicon layer on a substrate; crystallizing a partial region of the amorphous silicon layer into a polycrystalline silicon layer; and forming at least one transistor on the amorphous silicon layer that was not crystallized into the polycrystalline layer, wherein the electrostatic discharge protection circuit comprises the at least one transistor.
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