LID COMPONENT, PROCESS GAS DIFFUSION SUPPLY APPARATUS, AND SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a lid component for a substrate processing apparatus which secures in-plane uniformity of plasma processing in a substrate.SOLUTION: A plasma processing apparatus 10 has: a processing chamber 11 housing a wafer W; and a shower head 13 supplying a process gas to the processing chamber 11. The shower head 13 has: an internal space 38 formed in the shower head 13 and spreading in parallel with a surface of the wafer W housed in the processing chamber 11; multiple gas supply holes 42 allowing the internal space 38 to communicate with the processing chamber 11; and a lid component 50. A process gas introduction tube 40 is connected with the internal space 38 through an opening 39, and the opening 39 faces a part of the multiple gas supply holes 42. The lid component 50 includes: a bottom part 51 disposed in the internal space 38 and having a surface facing the opening 39; and a side wall 52 supporting the bottom part 51 at a predetermined position. The surface of the bottom part 51 is arranged parallel with a surface of the wafer W, and the side wall 52 supports a part of the bottom part 51.