发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING ELECTRONIC DEVICE |
摘要 |
A method of manufacturing a semiconductor device, includes: providing a first adhesive layer on a support member; providing a film on the first adhesive layer; arranging a semiconductor element on the film; providing a resin layer on the film on which the semiconductor element is arranged, and forming a substrate including the semiconductor element and the resin layer on the film; and separating the film and the substrate from the first adhesive layer. |
申请公布号 |
US2013217189(A1) |
申请公布日期 |
2013.08.22 |
申请号 |
US201313749159 |
申请日期 |
2013.01.24 |
申请人 |
FUJITSU LIMITED;FUJITSU LIMITED |
发明人 |
SASAKI SHINYA;ISHIZUKI YOSHIKATSU;TANI MOTOAKI |
分类号 |
H01L21/58 |
主分类号 |
H01L21/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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