| 摘要 |
<p>A film forming apparatus (1000) is provided with: a material container (1100) in which a vapor deposition material is contained; a transport pipe (1200) for transporting a gas that contains a vapor of the vapor deposition material evaporated in the material container (1100); and a vapor deposition head (1300) for jetting the gas that has been transported through the transport pipe (1200) and contains the vapor of the vapor deposition material. The film forming apparatus (1000) is also provided with a heater for heating the material container (1100), the transport pipe (1200) and the vapor deposition head (1300). In addition, the material container (1100), the transport pipe (1200), the vapor deposition head (1300) and the heater are contained in a vacuum container (1400).</p> |
