| 摘要 |
<p>The purpose of the invention is to provide a semiconductor measurement device capable of obtaining measurement results that appropriately reflect pattern deformation even when multiple pattern-deforming factors are intermixed. To achieve said purpose, a semiconductor measurement device, which measures the dimensions between multiple measurement points at different positions of the edge of a reference pattern and the multiple corresponding points of the circuit pattern of an electronic device that correspond to the multiple measurement points, is proposed. The semiconductor measurement device: measures distances between a circuit pattern and the reference pattern present inside a prescribed measurement region; selects, from a first measured value group obtained from the values measured at multiple sites in the measurement region, a second measured value group on the basis of a prescribed sampling condition; and determines a measured value on the basis of the second measured value group.</p> |
