| 摘要 |
<p>Disclosed is a photocurable composition for imprint which has good pattern-transferring property and good detachability from mold (pattern formation surface) regardless of the type of polymerizable monomer to be used, whereby it is possible to form a pattern having a shape with excellent reproducibility; and a method for forming a pattern on a substrate by photoimprint using the composition. The photocurable composition for imprint includes (A) polymerizable monomer having (meth)acrylic group, (B) photoinitiator, and (C) hyperbranched polymer obtained by polymerizing polymerizable monomer having (meth)acrylic group. Preferably, the composition includes 0.1-10 parts by mass of the photoinitiator (B) and 0.1-10 parts by mass of the hyperbranched polymer (C) relative to 100 parts by mass of the polymerizable monomer (A).</p> |
