| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist composition excellent in a LWR (line width roughness) performance and resolution.SOLUTION: The photoresist composition comprises [A] a polymer having a structural unit (I) expressed by formula (1) and [B] an acid generator. In formula (1), Rto Reach independently represent a hydrogen atom, fluorine atom, hydrocarbon group having 1 to 20 carbon atoms, fluorinated hydrocarbon group having 1 to 20 carbon atoms or ORgroup, wherein at least one of Rand Ris a hydrocarbon group having 1 to 20 carbon atoms; and c represents 2 or 3. |
