发明名称 METHOD OF SEMICONDUCTOR QUANTUM CASCADE LASERS MANUFACTURING
摘要 <p>The present invention relates to a method of strained-layer quantum cascade lasers manufacturing characterized in that it entails manufacturing test layers, performing their measurements, determining growth parameters for the layers on the basis of these measurements and manufacturing a semiconductor cascade laser by epitaxial methods using said epitaxial growth parameters.</p>
申请公布号 WO2013120988(A1) 申请公布日期 2013.08.22
申请号 WO2013EP53063 申请日期 2013.02.15
申请人 ISOS TECHNOLOGIES SARL 发明人 WESOLOWSKI, MAREK;STRUPINSKI, WLODZIMIERZ
分类号 H01L21/66;H01S5/34 主分类号 H01L21/66
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