发明名称 EXPOSURE APPARATUS, EXCHANGE METHOD OF OBJECT, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <p>A first carrier unit carries out a substrate tray that supports a substrate from below from a substrate holder by sliding the substrate tray in one axis direction (Y-axis direction) parallel to the substrate surface. Meanwhile, a second carrier unit carries in a substrate tray that supports a substrate subject to carry-in from below onto the substrate holder by sliding the substrate tray in the Y-axis direction, in parallel with the carry-out operation of the substrate (in a state where a part of the substrate tray that supports the substrate subject to carry-out is located on the substrate holder). Consequently, exchange of the substrate on the substrate holder can speedily be performed.</p>
申请公布号 KR20130093482(A) 申请公布日期 2013.08.22
申请号 KR20127028817 申请日期 2011.03.10
申请人 NIKON CORPORATION 发明人 AOKI YASUO
分类号 H01L21/677;B65G49/06;G03F7/20 主分类号 H01L21/677
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